Si integrated ferroelectric MEMS sensors using epitaxial PZT thin films on γ-Al2O3/Si substrates

D. Akai
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Abstract

Epitaxial stacked structure on Si substrates attracts much attention to sensors and actuator applications using functional material such as ferroelectrics, pyroelectrics and piezoelectrics since characteristics of those materials depend on crystallinity and crystal orientation. The epitaxial γ-Al2O3 films on Si substrates are suitable for above applications, which exhibit desirable features such as chemical and physical stability and good interface characteristics with Si. In this paper, recent our progress of ferroelectric MEMS sensors using epitaxial PZT thin films on the epitaxial γ-Al2O3/Si structure was reported.
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在γ-Al2O3/Si衬底上采用外延PZT薄膜集成铁电MEMS传感器
硅衬底上的外延堆叠结构引起了诸如铁电体、热释电体和压电体等功能材料的传感器和执行器应用的广泛关注,因为这些材料的特性取决于结晶度和晶体取向。Si衬底上的外延γ-Al2O3薄膜具有良好的化学和物理稳定性以及与Si的良好界面特性,适合上述应用。本文报道了在外延γ-Al2O3/Si结构上采用外延PZT薄膜制备铁电MEMS传感器的最新进展。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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