Design and Optimization of ESD P-Direction Diode in Bulk FinFET Technology

You Li, M. Miao, R. Gauthier
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引用次数: 3

Abstract

We present an ESD P-direction STI diode fabricated in an advanced bulk FinFET technology. The impact on process and design parameters are evaluated in detail. With design optimization, the ESD P-direction STI diode achieves 46% and 16% performance improvement for It2/C and It2/Area relative to the C-direction design.
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体FinFET技术中ESD p方向二极管的设计与优化
我们提出了一种采用先进的体FinFET技术制造的ESD p方向STI二极管。详细评价了对工艺和设计参数的影响。通过优化设计,相对于C方向设计,p方向ESD STI二极管的It2/C和It2/Area的性能分别提高了46%和16%。
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