Analysis of impedance matching control

Yuuki Hirose, A. Kawamura, Atsushi Takayanagi, Hirokazu Takada
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引用次数: 5

Abstract

This paper is concerning a new impedance matching control used in the plasma processing. RF electricity is supplied to the plasma chamber and stability operation is required. For this purpose the impedance of the equivalent loads is controlled to be 50 [Ω]. Therefore the capacitance of capacitors in an LC circuit called a matching box is adjusted and the receiving end impedance is maintained to be 50 [Ω]. In this paper a novel control method of an impedance matching is proposed and the successful experimental results are presented.
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阻抗匹配控制分析
本文研究了一种用于等离子体加工的阻抗匹配控制方法。为等离子体室提供射频电,并要求稳定运行。为此,等效负载的阻抗被控制为50 [Ω]。因此,调整LC电路中称为匹配盒的电容器的电容,保持接收端阻抗为50 [Ω]。本文提出了一种新的阻抗匹配控制方法,并给出了成功的实验结果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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