Analysis of impedance matching control

Yuuki Hirose, A. Kawamura, Atsushi Takayanagi, Hirokazu Takada
{"title":"Analysis of impedance matching control","authors":"Yuuki Hirose, A. Kawamura, Atsushi Takayanagi, Hirokazu Takada","doi":"10.1109/IPEMC.2009.5157563","DOIUrl":null,"url":null,"abstract":"This paper is concerning a new impedance matching control used in the plasma processing. RF electricity is supplied to the plasma chamber and stability operation is required. For this purpose the impedance of the equivalent loads is controlled to be 50 [Ω]. Therefore the capacitance of capacitors in an LC circuit called a matching box is adjusted and the receiving end impedance is maintained to be 50 [Ω]. In this paper a novel control method of an impedance matching is proposed and the successful experimental results are presented.","PeriodicalId":375971,"journal":{"name":"2009 IEEE 6th International Power Electronics and Motion Control Conference","volume":"6 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2009-05-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2009 IEEE 6th International Power Electronics and Motion Control Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IPEMC.2009.5157563","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 5

Abstract

This paper is concerning a new impedance matching control used in the plasma processing. RF electricity is supplied to the plasma chamber and stability operation is required. For this purpose the impedance of the equivalent loads is controlled to be 50 [Ω]. Therefore the capacitance of capacitors in an LC circuit called a matching box is adjusted and the receiving end impedance is maintained to be 50 [Ω]. In this paper a novel control method of an impedance matching is proposed and the successful experimental results are presented.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
阻抗匹配控制分析
本文研究了一种用于等离子体加工的阻抗匹配控制方法。为等离子体室提供射频电,并要求稳定运行。为此,等效负载的阻抗被控制为50 [Ω]。因此,调整LC电路中称为匹配盒的电容器的电容,保持接收端阻抗为50 [Ω]。本文提出了一种新的阻抗匹配控制方法,并给出了成功的实验结果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Study and implementation of a single-stage three-phase AC-DC converter A resonant gate-drive circuit capable of high-frequency and high-efficiency operation Study of multi-level rectifier in high power system based on a novel virtual flux observer Power control strategy of electronic ballast for Metal Halide Lamps Design of a digital control IC of a current source based on a three-phase controlled rectifier
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1