Millimeter-wave modeling of isolated MOS substrate network through gate-bulk measurements

B. Dormieu, C. Charbuillet, F. Danneville, N. Kauffmann, P. Scheer
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引用次数: 3

Abstract

This paper presents a novel methodology for the extraction of the substrate network components in n-MOS isolated devices, based on original “Gate-Bulk” structures. Since the main model acceptance criteria is here the frequency dependency, a large part is devoted to accurately model distributed effects in the p-well and the deep n-well layers up to 80 GHz. The main structures are completed with intermediate structures which give a better understanding of the substrate distribution effects.
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通过栅极体测量的隔离MOS衬底网络的毫米波建模
本文提出了一种基于原始“栅极体”结构提取n-MOS隔离器件中衬底网络元件的新方法。由于这里的主要模型接受标准是频率依赖性,因此很大一部分用于精确地模拟p-井和深n-井层中高达80 GHz的分布效应。主结构由中间结构组成,可以更好地理解衬底分布效应。
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