Figure of merit analysis of nanostructured thermoelectric materials at room temperature

Md. Mer Mosharraf Hossain, S. Ahmed, S. M. Shahriar, Md. S. U. Zzaman, Avijit Das, A. Saha, Md. Belal Hossain Bhuian
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引用次数: 1

Abstract

In this paper, we mainly focused on analyzing the thermoelectric property i.e. figure of merit of different nanostructured materials in room temperature (300–310 K). Here we studied the transition-metal dichalcogenides, particularly Molybdenum Disulfide (MoS2); Metal Oxides, specifically Zinc Oxide (ZnO); and conventional semiconductor materials, i.e. n-type and p-type Silicon (Si) and Silicon Germanium (SiGe). At first, we calculated the electrical conductance (Ge), by using electronic density functional theory (DFT). Similarly, we calculated the thermal conductance (κ) using Tersoff empirical potential (TEP) model. With these calculated values of Ge and κ and the Seebeck coefficient (S), we calculated the figure of merit (ZT) at different room temperatures. The main findings of our research were the increased ZT of MoS2, which is slightly larger than p-type Si while, 2∼3 times larger than ZnO and 100∼103 times larger than conventionally used SiGe and n-type Si at room temperatures. We have further investigated a thermoelectric generator (TEG) device with these materials to validate our result.
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室温下纳米结构热电材料的性能分析图
本文主要分析了不同纳米结构材料在室温(300-310 K)下的热电性能,即优值图,主要研究了过渡金属二硫化物,特别是二硫化钼(MoS2);金属氧化物,特别是氧化锌;以及常规半导体材料,即n型和p型硅(Si)和硅锗(SiGe)。首先,我们利用电子密度泛函理论(DFT)计算了电导(Ge)。同样,我们使用Tersoff经验电位(TEP)模型计算热导率(κ)。利用这些计算出的Ge和κ值以及塞贝克系数(S),我们计算出了不同室温下的优值(ZT)。在室温下,MoS2的ZT比p型Si略大,比ZnO大2 ~ 3倍,比常规使用的SiGe和n型Si大100 ~ 103倍。我们进一步研究了使用这些材料的热电发电机(TEG)装置来验证我们的结果。
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