Structure and phase formation of ion-plasma vacuum-arc Zr-B-Si-C-Ti-(N) coatings during deposition

Dmitry S. Belov
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Abstract

Zr-B-Si-C-Ti-N and Zr-B-Si-C-Ti coating systems were produced by arc-PVD technique. For their deposition, a combined titanium cathode with a ZrB2-SiC insert was used. Deposition was carried out in a residual atmosphere of N2 and Ar. Coatings structure and composition were investigated. The Zr-B-Si-C-Ti coating is characterized by an amorphous-nanocrystalline structure. In this case, nanocrystallites were formed from complex (Zr, Ti) C, and the amorphous structure fraction is formed mainly by phases based on zirconium and silicon. The second system, deposited in a nitrogen residual atmosphere, Zr-B-Si-C-Ti-N, has a predominantly amorphous structure. Such a structure is formed mainly from borides, nitrides, carbides and complex compounds of zirconium, silicon and titanium.
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离子等离子体真空电弧Zr-B-Si-C-Ti-(N)涂层沉积过程中的结构和相形成
采用电弧pvd技术制备了Zr-B-Si-C-Ti- n和Zr-B-Si-C-Ti涂层体系。在沉积过程中,使用了钛阴极和ZrB2-SiC衬垫。在N2和Ar的残余气氛中进行沉积,研究了涂层的结构和成分。Zr-B-Si-C-Ti涂层具有非晶纳米晶结构。在这种情况下,纳米晶主要由配合物(Zr, Ti) C形成,非晶结构部分主要由基于锆和硅的相形成。第二种体系是在氮气残余气氛中沉积的Zr-B-Si-C-Ti-N,具有主要的非晶结构。这种结构主要由硼化物、氮化物、碳化物和锆、硅、钛的络合物形成。
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