High-Performance In0.52Al0.48As/In0.6Ga0.4As Power Metamorphic HEMT for Ka-Band Applications

Chia-Yuan Chang, E. Chang, Y. Lien, Y. Miyamoto, Szu-Hung Chen, L. Chu
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引用次数: 1

Abstract

A 70-nm In0.52Al0.48As/In0.6Ga0.4 power MHEMT with double delta-doping was fabricated and evaluated. The device has a high transconductance of 827 mS/mni. The saturated drain-source current of the device is 890 niA/mm. A current gain cutoff frequency (fT) of 200 GHz and a maximum oscillation frequency (fmax ) of 300 GHz were achieved due to the nanometer gate length and the high Indium content in the channel. When measured at 32 GHz, the 4 times 40 mum device demonstrates a maximum output power of 14.5 dBm with PldB of 11.1 dBm and the power gain is 9.5 dB. The excellent DC and RF performance of the 70-nm MHEMT shows a great potential for Ka-band power applications.
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用于ka波段应用的高性能In0.52Al0.48As/In0.6Ga0.4As功率变质HEMT
制备了双δ掺杂的70 nm In0.52Al0.48As/In0.6Ga0.4功率MHEMT并对其性能进行了评价。该器件具有827 mS/mni的高跨导。该器件的漏源饱和电流为890nia /mm。由于纳米栅极长度和通道中铟的高含量,实现了200 GHz的电流增益截止频率(fT)和300 GHz的最大振荡频率(fmax)。在32ghz下测量时,4倍40ma器件的最大输出功率为14.5 dBm, PldB为11.1 dBm,功率增益为9.5 dB。70纳米MHEMT具有优异的直流和射频性能,在ka波段功率应用中具有巨大的潜力。
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