Dynamic and Noise Performances of the Nothing On Insulator Device

C. Ravariu, Avireni Srinivasulu, D. Mihaiescu
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引用次数: 1

Abstract

This paper studies dynamic and noise simulations of an alternative tunnel transistor that is composed of the semiconductor/vacuum/ semiconductor succession on insulator. The body of the device is the vacuum zone that is equivalent to Nothing On Insulator (NOI). The conduction mechanisms were approbated to be the Fowler-Nordheim tunneling as reported in previous papers. Dynamic and noise regimes rather suggest the NOI applications at high frequencies: capacitances of 3÷7×10−17F/µm and reduced noise.
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无绝缘子装置的动态和噪声性能
本文研究了一种由绝缘体上半导体/真空/半导体接层构成的可选隧道晶体管的动态和噪声模拟。该装置的主体是真空区,相当于无绝缘体(NOI)。其传导机制被认为是Fowler-Nordheim隧道。动态和噪声机制更倾向于NOI在高频下的应用:3÷7×10 - 17F/µm的电容和降低的噪声。
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