M. Ramiączek-Krasowska, J. Prażmowska, A. Szyszka, R. Paszkiewicz, M. Tlaczala
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引用次数: 0
Abstract
The lithography as a basic process determines properties of microelectronic device. The main area of investigation is the resolution of the lithography operation. The resolution of optical lithography is insufficient for creation of gate electrodes in dedicated to high frequency operation transistors. The scaling ability causes increased interest in using of atomic force microscope (AFM) as nanolithography tool. In the paper, the results of the nanoscratching lithography by using AFM are presented. In this method a pattern is created in mechanical interaction of the AFM tip and the samples surface.
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