Variation in The Electronic and Microstructural Properties of Benzyl Viologen Treated MoS2/Si Heterojunction

D. Pradhan, Anurag Gartia, K. Sahoo, Tanmoy Parida, J. Kar
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Abstract

Molybdenum disulfide, being a low bandgap prototypical transition metal dichalcogenides, is widely used in modern devices for its outstanding material properties. An attempt has been made to modulate the properties of rapid thermally grown MoS2 thin films on silicon by varying the number of spin coatings of the benzyl viologen solution. The formation of grain-like morphology with the increase in number of spin coatings of BV solution were observed from FESEM images. AFM images were used to estimate the RMS roughness of BV treated MoS2 thin films. XRD pattern depicted the presence of the (002) characteristics peak around 2θ = 14.1°. Two Raman peaks has been observed around 389 cm−1 (E12g) and 408 cm−1 (A1g) for MoS2 films. The left shift in the A1g peak position is attributed to n-type nature in BV treated MoS2 thin films. Both XRD and Raman peak intensities are found to be deteriorated, with the number of coats of BV solution. The ideality factor, built-in voltage and carrier concentration have been calculated from I-V and C-V characteristics of MoS2/Si heterojunction. The ŋ and Vbi for six number of spin coatings are calculated as 1.35 and 0.35 V, respectively. The increase in the carrier concentration of MoS2 thin films has been observed for the rise in the number of spin coatings of BV solution.
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苯基紫外光处理MoS2/Si异质结电子和微观结构性能的变化
二硫化钼作为一种低带隙的典型过渡金属二硫族化合物,以其优异的材料性能被广泛应用于现代器件中。本文试图通过改变苯基紫外光溶液的自旋涂层数来调节在硅上快速热生长的二硫化钼薄膜的性能。FESEM观察到随着BV溶液中自旋涂层数量的增加,BV溶液中颗粒状形貌的形成。利用原子力显微镜(AFM)图像估计BV处理的二硫化钼薄膜的RMS粗糙度。XRD谱图显示在2θ = 14.1°附近存在(002)特征峰。MoS2薄膜在389 cm−1 (E12g)和408 cm−1 (A1g)处观察到两个拉曼峰。在BV处理的MoS2薄膜中,A1g峰位置的左移归因于n型性质。随着BV溶液层数的增加,XRD和Raman峰强度逐渐变差。从MoS2/Si异质结的I-V和C-V特性计算了理想因数、内置电压和载流子浓度。计算出6种自旋涂层的Vbi值分别为1.35 V和0.35 V。BV溶液中自旋涂层数量的增加与二硫化钼薄膜载流子浓度的增加有关。
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