Magnetron Sputtering Deposition of Copper on Polymers in High Density Interconnection PCB's

J. Borecki, J. Felba, W. Posadowski
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引用次数: 4

Abstract

At last years the extreme demand on miniaturized, functional and also more and more reliable electronic equipment is observed. The development of electronic industry strongly depends on scale of electronic components miniaturization but also depends on miniaturization and kind of printed circuit boards (PCBs). The high level of integration of electronic components, such as Chip Size Packages (CSPs) or micro scale Ball Grid Arrays (μBGAs) determines the designers of electronic devices to create modern layouts. The using of appropriate materials on PCBs and using of newest techniques of manufacture creates the new possibilities of electronics application. At present, the polymers plays more and more important role in electronics, especially in flexible electronics. The big challenge is manufacture of connections and interconnections in polymer PCBs. In the paper the idea of interconnections metallization by using of magnetron sputtering deposition of copper is presented. Such process permits to metallize of interconnections based on microvias with high aspect ratio (deep/diameter) even about 5:1. The realized investigations show that the mentioned technology is the big success in domain of techniques of interconnections metallization and it is very promising for High Tech PCBs manufacturers.
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磁控溅射镀铜在高密度互连PCB的聚合物上
近年来,人们对电子设备的小型化、功能化和可靠性的要求越来越高。电子工业的发展在很大程度上取决于电子元件的小型化规模,同时也取决于印刷电路板的小型化和种类。电子元件的高集成度,如芯片尺寸封装(csp)或微尺度球栅阵列(μ bga)决定了电子设备的设计人员创建现代布局。在pcb上使用合适的材料和使用最新的制造技术,为电子应用创造了新的可能性。目前,聚合物在电子领域,尤其是柔性电子领域发挥着越来越重要的作用。最大的挑战是在聚合物pcb中制造连接和互连。本文提出了磁控溅射镀铜互连金属化的思想。这种工艺允许基于高纵横比(深/直径)甚至约5:1的微通孔的互连金属化。实现的研究表明,该技术在互连金属化技术领域取得了巨大的成功,对高科技pcb制造企业具有广阔的应用前景。
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