Effect of deposition temperature to electrical, structural and optical properties of amorphous carbon thin film prepared by TCVD

F. Mohamad, U. Noor, M. Rusop
{"title":"Effect of deposition temperature to electrical, structural and optical properties of amorphous carbon thin film prepared by TCVD","authors":"F. Mohamad, U. Noor, M. Rusop","doi":"10.1109/SHUSER.2012.6268906","DOIUrl":null,"url":null,"abstract":"Amorphous carbon (a-C) thin films have been prepared by thermal chemical vapor deposition (TCVD) technique at different temperature. The preparation involved argon (Ar), and camphor as carrier gas and carbon source respectively. The effects of deposition temperature in the a-C thin film on electrical, structural and optical properties was characterized by using Advantest R6243 DC Voltage Current Source/Monitor and SemiPro Curve Software, Scanning Electron Microscopy (SEM) and UV-VIS-NIR spectroscopy. The current-voltage (I-V) measurement studies demonstrate that the conductivity increased along the deposition temperature. There are also significant changes in structural and optical band gap as deposition temperature varies.","PeriodicalId":426671,"journal":{"name":"2012 IEEE Symposium on Humanities, Science and Engineering Research","volume":"48 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2012-06-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2012 IEEE Symposium on Humanities, Science and Engineering Research","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SHUSER.2012.6268906","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

Amorphous carbon (a-C) thin films have been prepared by thermal chemical vapor deposition (TCVD) technique at different temperature. The preparation involved argon (Ar), and camphor as carrier gas and carbon source respectively. The effects of deposition temperature in the a-C thin film on electrical, structural and optical properties was characterized by using Advantest R6243 DC Voltage Current Source/Monitor and SemiPro Curve Software, Scanning Electron Microscopy (SEM) and UV-VIS-NIR spectroscopy. The current-voltage (I-V) measurement studies demonstrate that the conductivity increased along the deposition temperature. There are also significant changes in structural and optical band gap as deposition temperature varies.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
沉积温度对TCVD法制备非晶碳薄膜电学、结构和光学性能的影响
采用热化学气相沉积(TCVD)技术在不同温度下制备了非晶碳(a-C)薄膜。该工艺以氩气和樟脑为载气和碳源。利用Advantest R6243直流电压电流源/监视器和SemiPro曲线软件、扫描电镜(SEM)和紫外-可见-近红外光谱(UV-VIS-NIR)分析了沉积温度对a-C薄膜电学、结构和光学性能的影响。电流-电压(I-V)测量研究表明,电导率随沉积温度的增加而增加。随着沉积温度的变化,结构和光带隙也发生了显著的变化。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Islamic inheritance claim processes — Non-normality data traits and best estimator choice Treatment effectiveness of continuous passive motion machine during post-operative treatment of anterior cruciate ligament patients Harmonic elimination in switching table-based direct torque control of five-phase PMSM using matrix converter Digital stable IIR high pass filter optimization using PSO-CFIWA IPv6 attack scenarios testbed
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1