Effect of In-homogeneities on Schottky barrier height & Richardson constant of Ni-AlGaN/GaN Schottky contact

Ajay Kumar Visvkarma, Chanchal, C. Sharma, N. Saini, M. Saxena, R. Laishram, D. S. Rawal
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Abstract

In this article, we present the variation in schottky barrier height (SBH) and ideality factor of Ni schottky contact (area $1.0\times 10^{-4}\ \ \text{cm}^{2}$) on AlGaN/GaN epitaxial layer with temperature (77 K to 350 K). The spread of SBH and ideality factor is in the range of 0.32 eV-1.05 eV and 7.16-1.48 respectively. The dependence of SBH and ideality factor points to the presence of in-homogeneities at Ni/AlGaN interface. Presence of these in-homogeneities at the metal/semiconductor interface leads to an inaccurate value of Richardson constant extracted using Richardson's plot. A Gaussian distribution of in-homogeneities at the interface is considered and included further in the standard schottky diode equation to obtain a modified Richardson's plot in order to extract a more precise value of Richardson constant for AlGaN epitaxial layer. The Schottky barrier height and Richardson constant obtained considering Gaussian distribution is 1.01 eV and 33.4 Acm−2K−2 respectively. Moreover the variation of diode series resistance with temperature is also determined using Cheung's method which is found to be increasing linearly with temperature.
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非均匀性对Ni-AlGaN/GaN肖特基接触肖特基势垒高度和Richardson常数的影响
本文研究了温度(77 K ~ 350 K)下AlGaN/GaN外延层Ni肖特基势垒高度(SBH)和Ni肖特基接触理想因子(面积$1.0\ × 10^{-4}\ \ \text{cm}^{2}$)随温度的变化,SBH和理想因子的扩散范围分别为0.32 eV ~ 1.05 eV和7.16 ~ 1.48 eV。SBH与理想因子的相关性表明Ni/AlGaN界面存在非均质性。这些非均匀性在金属/半导体界面的存在导致使用理查德森图提取的理查德森常数值不准确。考虑了界面处非均匀性的高斯分布,并将其进一步纳入标准肖特基二极管方程中,得到了改进的理查德森图,以便更精确地提取AlGaN外延层的理查德森常数值。考虑高斯分布的Schottky势垒高度和Richardson常数分别为1.01 eV和33.4 Acm−2K−2。此外,用张氏方法测定了二极管串联电阻随温度的变化,发现串联电阻随温度线性增加。
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