Ajay Kumar Visvkarma, Chanchal, C. Sharma, N. Saini, M. Saxena, R. Laishram, D. S. Rawal
{"title":"Effect of In-homogeneities on Schottky barrier height & Richardson constant of Ni-AlGaN/GaN Schottky contact","authors":"Ajay Kumar Visvkarma, Chanchal, C. Sharma, N. Saini, M. Saxena, R. Laishram, D. S. Rawal","doi":"10.1109/icee50728.2020.9777042","DOIUrl":null,"url":null,"abstract":"In this article, we present the variation in schottky barrier height (SBH) and ideality factor of Ni schottky contact (area $1.0\\times 10^{-4}\\ \\ \\text{cm}^{2}$) on AlGaN/GaN epitaxial layer with temperature (77 K to 350 K). The spread of SBH and ideality factor is in the range of 0.32 eV-1.05 eV and 7.16-1.48 respectively. The dependence of SBH and ideality factor points to the presence of in-homogeneities at Ni/AlGaN interface. Presence of these in-homogeneities at the metal/semiconductor interface leads to an inaccurate value of Richardson constant extracted using Richardson's plot. A Gaussian distribution of in-homogeneities at the interface is considered and included further in the standard schottky diode equation to obtain a modified Richardson's plot in order to extract a more precise value of Richardson constant for AlGaN epitaxial layer. The Schottky barrier height and Richardson constant obtained considering Gaussian distribution is 1.01 eV and 33.4 Acm−2K−2 respectively. Moreover the variation of diode series resistance with temperature is also determined using Cheung's method which is found to be increasing linearly with temperature.","PeriodicalId":436884,"journal":{"name":"2020 5th IEEE International Conference on Emerging Electronics (ICEE)","volume":"21 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2020-11-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2020 5th IEEE International Conference on Emerging Electronics (ICEE)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/icee50728.2020.9777042","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
In this article, we present the variation in schottky barrier height (SBH) and ideality factor of Ni schottky contact (area $1.0\times 10^{-4}\ \ \text{cm}^{2}$) on AlGaN/GaN epitaxial layer with temperature (77 K to 350 K). The spread of SBH and ideality factor is in the range of 0.32 eV-1.05 eV and 7.16-1.48 respectively. The dependence of SBH and ideality factor points to the presence of in-homogeneities at Ni/AlGaN interface. Presence of these in-homogeneities at the metal/semiconductor interface leads to an inaccurate value of Richardson constant extracted using Richardson's plot. A Gaussian distribution of in-homogeneities at the interface is considered and included further in the standard schottky diode equation to obtain a modified Richardson's plot in order to extract a more precise value of Richardson constant for AlGaN epitaxial layer. The Schottky barrier height and Richardson constant obtained considering Gaussian distribution is 1.01 eV and 33.4 Acm−2K−2 respectively. Moreover the variation of diode series resistance with temperature is also determined using Cheung's method which is found to be increasing linearly with temperature.