Kenji Yoshida, T. Mitsuhashi, Y. Nakada, Toshiaki Chiba, Kiyoshi Ogita, S. Nakatsuka
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引用次数: 10
Abstract
This paper describes a new design rule checking system for LSI mask patterns. Major features of the system are a relatively small computing time needed, even for very large circuits (e.g. 10,000 elements), wide applications to a variety of fabrication processes, due to its functional flexibility, and minimized spurious errors.
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