Performance Optimization of Dual supply voltage level shifter using FINFET and CNTFET at 32nm technology

P. Singla, Urvashi Bansal
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Abstract

With bulk CMOS technology scaling below 100 nm, there is significant increase of leakage power in that. Multigate FET like FINFET and CNTFET (carbon Nano tube field effect transistor) are the devices to replace that because of improved drive strength and short channel behavior. This paper represents dual supply voltage level shifter which is capable of converting low input of voltage to high level. This proposes a comparative study of voltage level shifter at 32nm technology node of MOSFET, FINFET and CNTFET. Simulations results tells us that there is notable improvement at frequency 0.5Mz in average power and PDP of 7.50E-07 W and 3.57E-14 in FINFET and 9.58E-07 W and 2.45E − 14 in case of CNTFET with comparison of MOSFET.
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采用32纳米技术的FINFET和CNTFET双电源电压电平转换器的性能优化
随着块体CMOS技术在100 nm以下的尺寸,漏功率显著增加。多栅极场效应晶体管,如FINFET和CNTFET(碳纳米管场效应晶体管),由于提高了驱动强度和短通道性能,是取代它的器件。本文介绍了一种能够将低输入电压转换为高输入电压的双电源电压移电平器。本文对MOSFET、FINFET和cnfet在32nm技术节点上的电压电平移位器进行了比较研究。仿真结果表明,在0.5Mz频率下,FINFET的平均功率和PDP分别为7.50E-07 W和3.57E-14, cnfet的平均功率和PDP分别为9.58E-07 W和2.45E -14,与MOSFET相比有显著提高。
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