Impact ionization and photon emission in MOS capacitors and FETs

P. Palestri, M. Pavesi, P. Rigolli, L. Selmi, A. Dalla Serra, A. Abramo, F. Widdershoven, E. Sangiorgi
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引用次数: 6

Abstract

This paper addresses the problem of the origin of majority and minority carriers' substrate currents in MOS devices. In particular, we present a critical analysis of published and original tunneling experiments by means of a novel, physically based model of impact ionization and hot carrier photon emission and re-absorption in the substrate. The model explains some relevant features of substrate minority carrier currents in saturated nMOSFETs, and provides a better understanding of the origin of substrate currents in tunneling MOS capacitors.
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MOS电容器和场效应管的冲击电离和光子发射
本文研究了MOS器件中多数载流子和少数载流子基片电流的来源问题。特别地,我们通过一种新的、基于物理的碰撞电离和热载流子光子发射和衬底再吸收模型,对已发表的和原始的隧道实验进行了批判性分析。该模型解释了饱和nmosfet中衬底少数载流子电流的一些相关特征,并更好地理解了隧道MOS电容器中衬底电流的来源。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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