Migratory Gold Resistive Shorts: Chemical Aspects of a Failure Mechanism

F. Grunthaner, T. Griswold, P. J. Clendening
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引用次数: 32

Abstract

Integrated-circuit devices using the Ti/W/Au metal system are subject to failure mechanisms based on electrolytic corrosion. The migratory gold resistive short (MGRS) failure mode is one example of this mechanism and results in the formation of filamentary or dendritic deposits of gold between adjacent stripes. on the IC chip. This reaction requires the presence of a sufficient amount of water, a bias voltage between adjacent stripes, and the activation of the cathodic (-) stripe. Gold ions are transported from anode to cathode through a film of moisture adsorbed on the surface of the chip; halide ions are probably involved in the transfer. Their presence is verified experimentally by x-ray photoelectron spectroscopy. Some of the chemical and electrostatic factors involved in the MGRS mechanism are discussed in this paper, including the questions of a threshold level of moisture and contamination.
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迁移金电阻短线:失效机制的化学方面
使用Ti/W/Au金属体系的集成电路器件容易受到基于电解腐蚀的失效机制的影响。迁移性金电阻短(MGRS)破坏模式是这种机制的一个例子,它导致相邻条纹之间形成丝状或枝状金矿床。在IC芯片上。这个反应需要足够的水,相邻条纹之间的偏置电压,以及阴极(-)条纹的激活。金离子通过吸附在芯片表面的湿气膜从阳极输送到阴极;卤化物离子可能参与了转移。用x射线光电子能谱实验证实了它们的存在。本文讨论了涉及MGRS机制的一些化学和静电因素,包括湿度和污染的阈值水平问题。
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