Integrated CAD System for an MMIC using Symbolic Layout

Yoshinobu Sasaki, N. Tanino, Shigeru Mitsui
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引用次数: 1

Abstract

In this paper, a microwave symbolic layout is proposed as an interface between a circuit simulation and a mask pattern. This system is separated from the design of process oriented design rules allowing a designer to design a circuit without understanding the complicated MMIC process. An automatic conversion program has been also developed to convert from a mricrowave symbolic layout to a mask pattern. Using this system, a designer can consistently go from the circuit design operation to the mask data creation.
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基于符号布局的MMIC集成CAD系统
本文提出了一种微波符号布局作为电路仿真和掩模图之间的接口。该系统从面向过程的设计规则中分离出来,允许设计人员在不了解复杂的MMIC过程的情况下设计电路。还开发了一个自动转换程序,将微波符号布局转换为掩模模式。使用该系统,设计人员可以始终如一地从电路设计操作到掩模数据创建。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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