Manufacturability of dummy-gate self-aligned LDD GaAs MESFETs for high volume production

S. Nakajima, G. Ishii, Y. Saito, N. Kuwata, T. Fukuzawa, K. Koike, H. Nishizawa
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引用次数: 6

Abstract

A manufacturable self-aligned LDD GaAs MESFET process called SRD has been developed. In this process, we controlled the fabrication conditions from lot to lot. Excellent control of the device characteristics not only across the wafer but also from wafer to wafer is obtained. The controllability of Vth is within /spl plusmn/50 mV. The standard deviation of Vth across the 3-in wafer is less than 30 mV for 0.5 /spl mu/m devices. In addition, other parameters such as g/sub m/, g/sub d/ are also well controlled within /spl plusmn/7% (Max-Min).
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用于大批量生产的假栅自对准LDD GaAs mesfet的可制造性
一种可制造的自对准LDD GaAs MESFET工艺被称为SRD。在这个过程中,我们对每个批次的制造条件进行了控制。不仅在晶圆上,而且在晶圆与晶圆之间都获得了优异的器件特性控制。Vth的可控性在/spl plusmn/ 50mv以内。对于0.5 /spl mu/m器件,Vth在3-in晶圆上的标准差小于30 mV。此外,g/sub m/、g/sub d/等参数也控制在/spl + usmn/7%以内(Max-Min)。
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