{"title":"Current Directions In Resonant Tunneling Research","authors":"T. Sollner","doi":"10.1109/CORNEL.1987.721244","DOIUrl":null,"url":null,"abstract":"Resonant tunneling through double-barrier heterostructures has attracted increasing interest recently, largely because of the fast charge transport1 it provides. In addition, the negative differential resistance regions that exist in the current-voltage (I-V) curve (peak-to-valley ratios of 3.5:l at room tem~erature~-~ and nearly 1O:l at 77 K have been measured) suggest that high-speed devices based on the unique character of the I-V curve should be possible. For example, the negative differential resistance region is capable of providing the gain necessary for high-frequency o~cillations.~ In our laboratory we have been attempting to increase the frequency and power of these oscillators,6 and to demonstrate several different highfrequency devices. Others have worked toward a better understanding of the equivalent circuit of the device7 and the underlying processes responsible for the frequency Many three-terminal devices using resonant tunneling in various ways have also been proposed and fabricated.11-20 In this paper we will summarize the work at Lincoln Laboratory on microwave and millimeter-wave devices, discuss the possibility of applications of resonant tunneling to digital logic, and then review some three-terminal devices that have been proposed, and in some cases tested.","PeriodicalId":247498,"journal":{"name":"IEEE/Cornell Conference on Advanced Concepts in High Speed Semiconductor Devices and Circuits, 1987. Proceedings.","volume":"46 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1987-08-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE/Cornell Conference on Advanced Concepts in High Speed Semiconductor Devices and Circuits, 1987. Proceedings.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CORNEL.1987.721244","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

Abstract

Resonant tunneling through double-barrier heterostructures has attracted increasing interest recently, largely because of the fast charge transport1 it provides. In addition, the negative differential resistance regions that exist in the current-voltage (I-V) curve (peak-to-valley ratios of 3.5:l at room tem~erature~-~ and nearly 1O:l at 77 K have been measured) suggest that high-speed devices based on the unique character of the I-V curve should be possible. For example, the negative differential resistance region is capable of providing the gain necessary for high-frequency o~cillations.~ In our laboratory we have been attempting to increase the frequency and power of these oscillators,6 and to demonstrate several different highfrequency devices. Others have worked toward a better understanding of the equivalent circuit of the device7 and the underlying processes responsible for the frequency Many three-terminal devices using resonant tunneling in various ways have also been proposed and fabricated.11-20 In this paper we will summarize the work at Lincoln Laboratory on microwave and millimeter-wave devices, discuss the possibility of applications of resonant tunneling to digital logic, and then review some three-terminal devices that have been proposed, and in some cases tested.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
共振隧道研究的当前方向
通过双势垒异质结构的共振隧穿引起了越来越多的兴趣,主要是因为它提供了快速电荷传输1。此外,电流-电压(I-V)曲线中存在的负差分电阻区(室温下的峰谷比为3.5:1,77 K时的峰谷比接近10:1)表明,基于I-V曲线独特特性的高速器件应该是可能的。例如,负差分电阻区能够提供高频o~振荡所需的增益。在我们的实验室里,我们一直在尝试增加这些振荡器的频率和功率,6并演示了几种不同的高频设备。另一些人则致力于更好地理解器件的等效电路和产生频率的基本过程。许多以各种方式使用谐振隧道的三端器件也被提出和制造出来。在本文中,我们将总结林肯实验室在微波和毫米波器件方面的工作,讨论谐振隧道应用于数字逻辑的可能性,然后回顾一些已经提出的三端器件,并在某些情况下进行了测试。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
A Self-Aligned AlGaAs/GaAs Heterostructure Bipolar Transistor With Non Alloyed Graded-Gap Ohmic Contacts To The Base And Emitter Advanced Device Fabrication With Angled Chlorine Ion Beam Assisted Etching Sub-100 nm Gate Length GaAs MESFETs Fabricated By Molecular Beam Epitaxy And Electron Beam Lithography Operation Of a p-channel, GaAs/(In,Ga)As, Strained Quantum Well Field-effect Transistor At 4 K AlGaAs/GaAs Heterojunction Bipolar Transistors For Power Applications
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1