Design analysis and fabrication of side-drive electrostatic micromotor by UV-SLIGA

R. Shukla, Gowtham Beera, A. Dubey, Varun Sharma, P. R. Sankar, R. Dhawan, P. Tiwari, A. Sinha
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引用次数: 3

Abstract

In the present work, a micro-electro-mechanical system (MEMS)-based electrostatic micromotor is designed and fabricated. Finite element analysis is done and various parameters affecting the torque are studied. Maximum torque is achieved at 120° phase angle. The effect of change in voltage, micromotor height and frequency is analysed and discussed. UV-SLIGA, a microfabrication technique, is used for the fabrication of electrostatic micromotor of height 30µm and higher. UV lithography is conducted by both positive AZ P4620 and negative (SU-8 10 and SU-8 2150) photoresists. Copper (Cu) is used as a sacrificial layer to release the rotor (the movable part) of the electrostatic micromotor. Electroformed nickel (Ni) is used for making stator, rotor and axle, whereas chromium (Cr) is used as a seed layer. The micromotor is fabricated with a stator-rotor pole having configuration ratio of 3:2. The gap between the rotor and axle is 20 µm. Wet chemical etching is used to etch the deposited metal layers (Cr, Ni and Cu). Challenges such as the adhesion between the photoresist mould and substrate, cracks, seepage and misalignment are faced during the microfabrication. These challenges are overcome by optimizing the various parameters. The fabrication of electrostatic micromotor is done successfully and the results are discussed in the article.
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侧驱静电微电机的UV-SLIGA设计分析与制造
本文设计并制作了一种基于微机电系统(MEMS)的静电微电机。进行了有限元分析,研究了各参数对转矩的影响。最大扭矩达到120°相位角。分析和讨论了电压、微电机高度和频率变化的影响。UV-SLIGA是一种微加工技术,用于制造高度为30µm及以上的静电微电机。UV光刻是由正极AZ P4620和负极(SU-8 10和SU-8 2150)光刻胶进行的。采用铜(Cu)作为牺牲层,释放静电微电机的转子(活动部分)。电铸镍(Ni)用于制造定子、转子和轴,而铬(Cr)用作种子层。所述微电机采用定子-转子极,定子-转子极的配置比为3:2。转子与轴之间的间隙为20µm。湿化学蚀刻是用来蚀刻沉积金属层(Cr, Ni和Cu)。在微加工过程中,光刻胶模具与基材之间的粘连、裂纹、渗漏和错位等问题都面临着挑战。通过优化各种参数来克服这些挑战。本文成功地制作了静电微电机,并对结果进行了讨论。
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