R. Kuis, T. Gougousi, Isaac Basaldua, Paul Burkins, J. A. Kropp, A. Johnson
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引用次数: 0
Abstract
Nonlinear refractive index, n2, values as high as 1±.1x10-9 cm2/W were measured in atomic layer deposition (ALD) grown TiO2 nanoscale films, using femtosecond thermally managed Z-scan. The several order of magnitude increase in n2 is believed due to the incorporation of nitrogen during growth.
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