{"title":"Further advances in electron beam recording","authors":"G. Reynolds","doi":"10.1117/12.399334","DOIUrl":null,"url":null,"abstract":"Initial process trials have concentrated on making continuous groove structures. This allows the mechanical and beam stability of the electron beam mastering system to be fully evaluated. The process conditions for different resists and developers have been evaluated. However, unlike e-beam lithography, for optical disc mastering it is essential to be able to control the slope of feature edges in thin resist layers making the choice of resist and process conditions even more critical.","PeriodicalId":215485,"journal":{"name":"2000 Optical Data Storage. Conference Digest (Cat. No.00TH8491)","volume":"116 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2000 Optical Data Storage. Conference Digest (Cat. No.00TH8491)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.399334","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 5
Abstract
Initial process trials have concentrated on making continuous groove structures. This allows the mechanical and beam stability of the electron beam mastering system to be fully evaluated. The process conditions for different resists and developers have been evaluated. However, unlike e-beam lithography, for optical disc mastering it is essential to be able to control the slope of feature edges in thin resist layers making the choice of resist and process conditions even more critical.
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