Improvement in surface quality of diamond-turned aluminium substrate by using hydrogen peroxide: a molecular dynamics simulation study

Prabhat Ranjan, Anuj Sharma, R. Balasubramaniam
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引用次数: 1

Abstract

In this work, the atomic mechanism of chemical treatment on diamond-turned aluminium surface due to aqueous H2O2 is investigated using a reactive molecular dynamics simulation (R-MDS). This study is carried out to understand the mechanism of surface quality improvement of a diamond-turned aluminium workpiece due to chemical treatment. Surface quality improvement is focused to analyse the effect of chemical treatment process for improving surface finish, reflectance and chemical stability of the workpiece. It is observed that the diamond-turned surface contains a higher cohesive energy as compared to atomically smooth surfaces. Chemical treatment does more material removal on nano-peaks with respect to the smooth surface, and this helps to reduce the cohesive energy as low as naturally possible. By applying this treatment, the optical quality of the workpiece gets enhanced drastically. R-MDS also reveals that the nano-peaks of diamond turn machining (DTM) surface can further improve surface finish by using the chemical treatment process, and the same is validated by experiments. Experimental data also support that due to the reduction of surface roughness, reflectance increases in a broad band of wavelength. The present work shows that material removal from the nano-peaks of workpiece occurs due to the oxygen radicals generated from H2O2, which raise the local temperature, followed by temperature-assisted chemical reaction. When most of the nano-peak atoms are removed, further material removal stops. Experimental results also support the mechanism of such process of chemical treatment. Hence, the diamond turned surface can be further improved beyond the capability of the diamond turning process to cater the need for optics and astronomical mirror at-least one step ahead in the domain of ultra-precision manufacturing.
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过氧化氢改善金刚石转铝基板表面质量的分子动力学模拟研究
本文采用反应分子动力学模拟(R-MDS)研究了H2O2对金刚石转铝表面化学处理的原子机理。本研究旨在了解化学处理对金刚石车削铝工件表面质量改善的机理。重点分析了化学处理工艺对提高工件表面光洁度、反射率和化学稳定性的效果。与原子光滑表面相比,金刚石表面具有更高的内聚能。相对于光滑的表面,化学处理可以在纳米峰上去除更多的材料,这有助于尽可能自然地降低内聚能。通过这种处理,工件的光学质量得到了极大的提高。R-MDS还揭示了金刚石车削加工(DTM)表面的纳米峰可以通过化学处理工艺进一步提高表面光洁度,并通过实验验证了这一点。实验数据也支持,由于表面粗糙度的降低,反射率在较宽的波长范围内增加。本研究表明,由于H2O2产生的氧自由基提高了局部温度,随后发生了温度辅助化学反应,材料从工件的纳米峰上去除。当大多数纳米峰原子被去除时,进一步的材料去除就停止了。实验结果也支持了这一化学处理过程的机理。因此,金刚石车削表面可以进一步改进,超越金刚石车削工艺的能力,以满足光学和天文反射镜在超精密制造领域至少领先一步的需求。
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