Effects of Intermetallics on the Reliability of Tin Coated Cu, Ag, and Ni Parts

D. Olsen, R. Wright, H. Berg
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引用次数: 23

Abstract

The temperature dependence of the growth rates of intermetallic compounds in the Cu-Sn, Ag-Sn and Ni-Sn systems was determined between 100°C and 213°C for Sn-dipped and Sn-plated samples. Below 175°C the fastest growing intermetallic compound was Ag3Sn. The Ni-Sn compoknd, Ni3Sn, was the slowest growing phase below 150°C, but the fastest growing phase above 175°C. The two Cu-Sn intermetallic phases, Cu3Sn and Cu6Sn5, had a combined growth rate which increases more slowly with temperature than the single intermetallic phases observed in the Ni-Snand Ag-Sn systems. The growth rate data plotted against reciprocal temperature satisfies the Arrhenius relationship and yields a range of apparent activation energies between 14.8 Kcal/mole for Ag3Sn and 37.6 Kcal/mole for Ni3Sn4. The growth of intermetallic compounds can affect the reliability of electronic parts through a reduction in lead solderability or a decrease in the mechanical strength of soldered connections. Lap shear testing of metal strips bonded with Sn demonstrated that strengths of both bonded Ni and Cu strips decrease as the thickness of the intermetallic compounds increase during annealing at 213°C. In the case of Ni-Sn, a 50% reduction in joint strength occurred after only one day-at temperature. For Cu-Sn, the reduction in joint strength occurred at a slower rate, and only a slight decrease was observed in the Ag-Sn lap shear samples. The degradation observed in the Ni-Sn and Cu-Sn systems is related to the growth rate of brittle intermetallics forming at the interface (i.e. Ni3Sn4 and Cu3Sn).
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金属间化合物对镀锡铜、银、镍零件可靠性的影响
测定了Cu-Sn、Ag-Sn和Ni-Sn体系中金属间化合物生长速率在100°C至213°C之间的温度依赖性。175℃以下生长最快的金属间化合物是Ag3Sn。Ni-Sn化合物Ni3Sn在150℃以下生长最慢,而在175℃以上生长最快。Cu-Sn两种金属间相Cu3Sn和Cu6Sn5的复合生长速率随温度的升高比Ni-Snand Ag-Sn体系中单个金属间相的生长速率慢。生长速率与温度的关系满足Arrhenius关系,得到Ag3Sn的表观活化能为14.8 Kcal/mol, Ni3Sn4的表观活化能为37.6 Kcal/mol。金属间化合物的生长可以通过降低铅的可焊性或降低焊接连接的机械强度来影响电子零件的可靠性。对锡键合金属带的搭接剪切测试表明,在213℃退火过程中,随着金属间化合物厚度的增加,Ni和Cu键合金属带的强度都有所降低。在Ni-Sn的情况下,仅在温度下一天后,接头强度就降低了50%。对于Cu-Sn,接头强度的降低速度较慢,Ag-Sn搭接剪切试样的接头强度仅略有下降。Ni-Sn和Cu-Sn体系的退化与界面处形成的脆性金属间化合物(即Ni3Sn4和Cu3Sn)的生长速度有关。
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