J. X. Tang, M. H. Tang, F. Yang, J. J. Zhang, Yi Chun Zhou, X. J. Zheng
{"title":"Modeling of temperature characteristics for metal-ferroelectric-insulator-semiconductor devices","authors":"J. X. Tang, M. H. Tang, F. Yang, J. J. Zhang, Yi Chun Zhou, X. J. Zheng","doi":"10.1109/ICASIC.2007.4415813","DOIUrl":null,"url":null,"abstract":"Modeling of temperature characteristics for metal-ferroelectric-insulator-semiconductor devices is given in detail in this paper. Based on the Miller model, the polarization, the electric field in ferroelectric layer, surface potential, and drain-to-source current with gate voltage are investigated over a wide temperature range from 300 K to 600 K. From the model results, for the first time, we find that the semiconductor substrate can lead to the ferroelectric imprint under different temperatures, and there exists a zero-temperature-coefficient bias point in the transfer characteristic curves as conventional metal-oxide-semiconductor devices.","PeriodicalId":120984,"journal":{"name":"2007 7th International Conference on ASIC","volume":"17 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2007-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2007 7th International Conference on ASIC","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICASIC.2007.4415813","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2
Abstract
Modeling of temperature characteristics for metal-ferroelectric-insulator-semiconductor devices is given in detail in this paper. Based on the Miller model, the polarization, the electric field in ferroelectric layer, surface potential, and drain-to-source current with gate voltage are investigated over a wide temperature range from 300 K to 600 K. From the model results, for the first time, we find that the semiconductor substrate can lead to the ferroelectric imprint under different temperatures, and there exists a zero-temperature-coefficient bias point in the transfer characteristic curves as conventional metal-oxide-semiconductor devices.