Combining advanced process technology and design for systems level integration

A. Hunter, C. Lau, J. Martin
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引用次数: 4

Abstract

Recent advances in process and integration are enabling systems level integration for numerous applications. The quality of the systems depends directly on the quality of the processes and effectiveness of the process integration, and on the quality of the designs and libraries employed, as well as on the completeness and accuracy of the models used to link the process and designs. Unit process and process module quality is ensured through the use of designed experimentation, margin analysis, and statistical capability measurement. The link between the processes and the libraries and designs is formed through such models as SPICE and interconnect, with quality implications associated with the extraction and implementation. GDSII algorithms to incorporate process specific post layout features such as OPC and fill patterns for CMP planarization are integrated into the CAD flow prior to final verification, reticle manufacturing and silicon prototyping. Foundry specific challenges in providing process and library elements include multiple design flows, tool providers and library suppliers. Examples of approaches to quality designs, processes and systems are presented using advanced cores and systems level integration.
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结合先进的工艺技术和系统级集成设计
过程和集成方面的最新进展使许多应用程序能够进行系统级集成。系统的质量直接取决于过程的质量和过程集成的有效性,取决于所采用的设计和库的质量,以及用于连接过程和设计的模型的完整性和准确性。通过使用设计的实验、余量分析和统计能力测量来确保单元过程和过程模块的质量。过程与库和设计之间的联系是通过SPICE和interconnect等模型形成的,具有与提取和实现相关的质量含义。GDSII算法将工艺特定的后布局功能(如OPC和CMP平面化的填充模式)集成到最终验证,光栅制造和硅原型制作之前的CAD流程中。在提供流程和库元素方面,铸造厂面临的具体挑战包括多个设计流程、工具提供商和库供应商。方法的质量设计,过程和系统的例子提出了使用先进的核心和系统级集成。
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