Crossover from direct to trap assisted Fowler Nordheim (FN) tunneling in CoFeB/MgO/CoFeB magnetic tunnel junctions

D. Saha, Sang Yeol Lee
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Abstract

Electron conduction mechanisms in CoFeB (0.8-10 nm)/MgO (3nm)/CoFeB (4.2 nm) magnetic tunnel junctions (MTJs) have been investigated in detail. A clear crossover from direct tunnelling to trap assisted Fowler Nordheim (FN) tunneling is observed with increasing bias voltage in all the pristine MTJs. In contrast, FN-like tunneling is completely suppressed in vacuum annealed MTJs, which plausibly indicates diffused interfaces and enhanced trap state density in MgO barrier. In annealed MTJs, beyond the direct tunneling regime, bulk-limited Pool Frenkel emission followed by interface-limited Schottky emission are found to be the dominant transport mechanisms. Simulations of tunnel current density J (V) and differential conductance (dJ/dV) of MTJs have been carried out using Simmons (symmetric rectangular barrier) and Brinkman (asymmetric trapezoidal barrier) model, which provides valuable insights on the barrier height and interface property at the MgO/CoFeB interface. Results of this study might be helpful to further improve CoFeB/MgO based MTJs for efficient implementation in sensors and memory devices.
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在CoFeB/MgO/CoFeB磁性隧道结中,从直接到陷阱的交叉有助于Fowler Nordheim (FN)隧穿
详细研究了CoFeB (0.8 ~ 10nm)/MgO (3nm)/CoFeB (4.2 nm)磁性隧道结(MTJs)中的电子传导机制。在所有原始mtj中,随着偏置电压的增加,观察到从直接隧穿到陷阱辅助福勒-诺德海姆(FN)隧穿的明显交叉。相反,在真空退火的MTJs中,类fn隧道效应被完全抑制,这可能表明MgO势垒中界面扩散,陷阱态密度增强。在退火MTJs中,除直接隧穿外,主要的输运机制是体受限池Frenkel发射,其次是界面受限Schottky发射。采用Simmons(对称矩形势垒)和Brinkman(不对称梯形势垒)模型对MTJs的隧道电流密度J (V)和差分电导(dJ/dV)进行了模拟,为MgO/CoFeB界面的势垒高度和界面性质提供了有价值的见解。本研究结果可能有助于进一步改进基于CoFeB/MgO的MTJs,以便在传感器和存储器件中高效实现。
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