Enhancing the Speed of SiGe HBTs Using fT-Doubler Techniques

Jiahui Yuan, J. Cressler
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引用次数: 18

Abstract

A peak fT of 325 GHz is achieved, for the first time, in a 130 nm, 200 GHz, 3rd-generation SiGe HBT technology at 300 K, by utilizing fT-doubler techniques. This speed enhancement is equivalent to gaining an additional generational node (from 3rd to 4th), with no underlying change to the transistor profile or lithography. The fT-doubler can be treated as a single transistor unit cell during circuit design, which is verified by the investigation of its small-signal equivalent circuit. Reduced Cpi is demonstrated to be the root origin of the fT-enhancement. The impact of emitter geometry on performance is investigated. A record fT of 438 GHz is achieved at 93 K.
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利用倍频技术提高SiGe hbt的速度
在130 nm、200 GHz的第三代SiGe HBT技术中,通过利用fT倍频技术,在300 K下首次实现了325 GHz的峰值fT。这种速度的提高相当于获得了一个额外的代节点(从第3代到第4代),而晶体管的结构或光刻技术没有根本的变化。通过对其小信号等效电路的研究,验证了在电路设计时可将倍频器视为单个晶体管单元。降低的Cpi被证明是ft增强的根本原因。研究了发射极几何形状对性能的影响。在93 K时实现了438 GHz的创纪录fT。
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