Domino dual-rail, high-speed, NOR logic, with 300mV supply in 90 nm CMOS technology

A. Dadashi, O. Mirmotahari, Y. Berg
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引用次数: 1

Abstract

A new ultra low voltage (ULV) dual- rail NOR gate is presented in this paper, which uses the semi-floating-gate (SFG) technique to speed up the logic circuit. Higher speed in the lower supply voltages and robustness against the input signal delay variations, are the main advantage of the proposed gate in comparison to the previously reported domino dual-rail NOR gates. The simulation results in a typical TSMC 90nm CMOS technology show that the proposed NOR gate is more than 20 times faster than conventional dual-rail NOR gate.
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多米诺双轨,高速,NOR逻辑,采用90nm CMOS技术,300mV电源
本文提出了一种新型的超低电压(ULV)双轨NOR门,它采用半浮栅(SFG)技术来加快逻辑电路的速度。与之前报道的多米诺双轨NOR门相比,该门的主要优点是在较低的电源电压下具有更高的速度和对输入信号延迟变化的鲁棒性。在典型的台积电90nm CMOS工艺下的仿真结果表明,所提出的NOR门比传统的双轨NOR门快20倍以上。
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