250 nm InP DHBT monolithic amplifiers with 4.8 dB gain at 324 GHz

J. Hacker, M. Urteaga, D. Mensa, R. Pierson, Mike E. B. Jones, Z. Griffith, M. Rodwell
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引用次数: 41

Abstract

An indium-phosphide (InP) double-heterojunction bipolar transistor (DHBT) based common-base monolithic power amplifier has been fabricated and has a measured small signal gain of 4.8 dB at 324 GHz. This is the highest frequency DHBT MMIC amplifier reported to date. The submillimeter-wave power amplifier MMIC incorporates microstrip transmission lines on a 10-μm thick layer of BCB dielectric. The thick BCB layer provides mode-free low-loss millimeter-wave transmission lines without requiring a thin fragile InP substrate and through-wafer VIAs as with conventional microstrip placed directly on the semiconductor substrate. The single-stage power amplifier has a compact size of only 0.124 mm2 and a measured saturated output power of 1.3 milliWatts with a dc input power of 1.4 V at 12 mA. These results demonstrate the capability of 250nm InP DHBT technology to enable power amplifiers for submillimeter-wave applications.
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250nm InP DHBT单片放大器,在324 GHz时具有4.8 dB增益
制备了一种基于磷化铟(InP)双异质结双极晶体管(DHBT)的共基单片功率放大器,该放大器在324 GHz时的测量信号增益为4.8 dB。这是迄今为止报道的最高频率的DHBT MMIC放大器。亚毫米波功率放大器MMIC在10 μm厚的BCB介电层上集成了微带传输线。厚的BCB层提供无模低损耗毫米波传输线,而不需要薄而易碎的InP衬底和直接放置在半导体衬底上的传统微带的晶圆通孔。单级功率放大器尺寸紧凑,仅为0.124 mm2,测量饱和输出功率为1.3毫瓦,直流输入功率为1.4 V, 12 mA。这些结果证明了250nm InP DHBT技术能够实现亚毫米波应用的功率放大器。
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