A New Assist Technique to Enhance the Read and Write Margins of Low Voltage SRAM Cell

Santhosh Keshavarapu, Saumya Jain, M. Pattanaik
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引用次数: 8

Abstract

Improving the Noise margin is one of the important challenge in every state of the art SRAM design. Due to the Process variations like threshold voltage variations, supply voltage variations etc.. in scaled technologies, stable operation of the bit cell is critical to obtain with high yield in low-voltage SRAM. In this paper a new assist technique (Read assist and write assist) is proposed to enhance the read and write margins of the 6T SRAM bit cell and the same write assist circuit is applicable to enhance the write margin of the 8T SRAM bit cell. The simulations are performed in 90nm TSMC process Technology node and the read and write margin simulation results are compared with different SRAM circuits like 6T SRAM bit cell with cell ratio of 1, 2, 3 and Dynamic word line swing technique and 8T SRAM bit cell. The effect of temperature and threshold voltage values on Read and Write margins are observed. By using the proposed read assist technique the read margin is improved by 2.375 times for 6T cell and with write assist technique the write margin is improved by 1.89 times for 6T and 8T cells.
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一种提高低压SRAM单元读写裕度的新辅助技术
提高噪声裕度是当前SRAM设计的重要挑战之一。由于工艺变化,如阈值电压变化,电源电压变化等。在规模化技术中,位单元的稳定运行是获得低压SRAM高成品率的关键。本文提出了一种新的辅助技术(读辅助和写辅助)来提高6T SRAM位单元的读写余量,同样的写辅助电路也适用于提高8T SRAM位单元的写余量。在90nm TSMC制程节点上进行了仿真,并比较了6T SRAM位单元(单元比为1,2,3)和动态字线摆动技术以及8T SRAM位单元等不同SRAM电路的读写裕度仿真结果。观察到温度和阈值电压值对读和写边界的影响。采用读辅助技术,6T单元的读距提高了2.375倍,采用写辅助技术,6T和8T单元的写距提高了1.89倍。
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