Electrical Characterization of FEOL Bridge Defects in Advanced Nanoscale Devices Using TCAD Simulations

T. C. Wei, V. Narang, A. Thean
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引用次数: 4

Abstract

In this work, we present the electrical characterization of various Front-End-Of-Line (FEOL) bridge defects location using Technology Computer Aided Design (TCAD) based simulation. The electrical characteristics obtained from simulation is useful in identifying the possible locations of the bridge defects. The simulation result correlates well with nano-probing result collected on actual failing devices. Furthermore, simulation of potential defects provides a quick way of understanding how the defect may influence the electrical behavior of transistors.
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基于TCAD模拟的先进纳米器件FEOL桥缺陷电学表征
在这项工作中,我们采用基于计算机辅助设计(TCAD)的仿真技术,介绍了各种前端线(FEOL)桥梁缺陷定位的电气特性。通过模拟得到的电学特性对于识别桥梁缺陷的可能位置是有用的。仿真结果与实际故障器件上的纳米探测结果吻合较好。此外,对潜在缺陷的模拟提供了一种了解缺陷如何影响晶体管电学行为的快速方法。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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