Design of E/D-mode InAlN/GaN HFET inverter and its robustness analysis

L. Nagy, V. Stopjaková, A. Šatka
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引用次数: 1

Abstract

This article describes the design procedure towards a robust digital inverter that is intended to be fabricated on InAlN/GaN material heterostructure. Heterojunction field effect transistors (HFETs), regardless the material used, exhibit exceptional power delivery at high frequencies and also outstanding capability to withstand the operation in a very harsh environment. These properties make HFET transistors an excellent candidate for the future electronic applications. Effective utilization of such excellent properties requires monolithic integration of E-mode and D-mode transistors on a single die. However, the fabrication process of the heterostructures themselves and HFET transistors are not that mature and reliable as it is in the case of other materials used in microelectronics. In this paper, we describe the design of a basic logic circuit using both E-mode and D-mode HFETs as well as design of the output buffer. Due to immaturity of the technological process and physical constraints, the properties of depletion load based inverters and various output buffers are investigated in details with regard to the robustness.
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E/ d模式InAlN/GaN HFET逆变器设计及鲁棒性分析
本文介绍了一种基于InAlN/GaN材料异质结构的鲁棒数字逆变器的设计过程。无论使用何种材料,异质结场效应晶体管(hfet)在高频下都具有出色的功率输出,并且能够承受非常恶劣的环境。这些特性使HFET晶体管成为未来电子应用的优秀候选人。有效地利用这些优异的性能需要在单个芯片上集成e模和d模晶体管。然而,异质结构本身和fet晶体管的制造工艺并不像用于微电子的其他材料那样成熟和可靠。在本文中,我们描述了使用e型和d型hfet的基本逻辑电路的设计以及输出缓冲器的设计。由于工艺流程的不成熟和物理条件的限制,本文对基于耗尽负荷的逆变器和各种输出缓冲器的鲁棒性进行了详细的研究。
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