Fast physical models for Si LDMOS power transistor characterization

J. P. Everett, M. J. Kearney, H. Rueda, Eric M. Johnson, P. Aaen, J. Wood, C. Snowden
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引用次数: 2

Abstract

A new quasi-two-dimensional (Q2D) model is described for microwave laterally diffused MOS (LDMOS) power transistors. A set of one-dimensional energy transport equations are solved across a two-dimensional cross-section in a “current-driven” form. This process-oriented nonlinear model accounts for thermal effects, avalanche breakdown and gate conduction. It accurately predicts DC and microwave characteristics as demonstrated by comparison with measured DC characteristics, transconductance, forward gain, S21, and large-signal gate and drain charges for a LDMOS transistor. The model is fast, taking less than 30 ms to extract a 50 point DC IDS-VDS characteristic and less than 5 ms to produce S-parameters at a single frequency.
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Si LDMOS功率晶体管表征的快速物理模型
描述了一种新的准二维(Q2D)微波横向扩散MOS (LDMOS)功率晶体管模型。一组一维能量输运方程以“电流驱动”的形式在二维截面上求解。这种面向过程的非线性模型考虑了热效应、雪崩击穿和栅极传导。通过与实测的直流特性、跨导、正向增益、S21以及LDMOS晶体管的大信号门极和漏极电荷进行比较,可以准确地预测直流和微波特性。该模型速度快,提取50点直流IDS-VDS特性的时间不到30 ms,在单频下产生s参数的时间不到5 ms。
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