P. Rockett, J. Hunter, R. Olson, G. Kubiak, K. Berger, H. Shields, M. Powers
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引用次数: 0
Abstract
A Sandia/AT&T team is utilizing optics coated for reflection at 14 nm for projection x-ray lithography. An excimer laser-plasma source of XUV radiation has provided illumination for this work, demonstrating the viability of a laser-plasma x-ray source for ultra-large scale integration. The issues of designing such a source for projection lithography are distinct from synchrotron sources and require understanding the UV to XUV conversion process, mitigating debris from the laser-target, and establishing long-term reliability. We are approaching these problems in parallel by studying the conversion process in solid and thin-film targets, by designing an advanced tape drive as a long-lasting low-mass laser-target, and by choosing to work with excimer lasers as off-the-shelf industrial components.
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