{"title":"A new auto-focus method in critical dimension measurement SEM","authors":"F. Komatsu, H. Motoki, M. Miyoshi","doi":"10.1109/ATS.1997.643959","DOIUrl":null,"url":null,"abstract":"We have developed a new auto-focus method using the image processing technology. This method consists of two steps. The first step is the preset of the objective lens condition with the feedback of Z-sensor. In the second step, the pattern recognition of a target hole pattern is performed prior to auto-focusing scan in order to scan E-beam accurately over the pattern. The measurement repeatability (3/spl sigma/) can be achieved within 3.9 nm. The pass rate of 98.7% can be realized in the present auto-focus method.","PeriodicalId":330767,"journal":{"name":"Proceedings Sixth Asian Test Symposium (ATS'97)","volume":"33 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1997-11-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings Sixth Asian Test Symposium (ATS'97)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ATS.1997.643959","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
We have developed a new auto-focus method using the image processing technology. This method consists of two steps. The first step is the preset of the objective lens condition with the feedback of Z-sensor. In the second step, the pattern recognition of a target hole pattern is performed prior to auto-focusing scan in order to scan E-beam accurately over the pattern. The measurement repeatability (3/spl sigma/) can be achieved within 3.9 nm. The pass rate of 98.7% can be realized in the present auto-focus method.
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