Panel on Advanced Embedded Memory Technologies

B. Cockburn
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Abstract

At present, system-on-a-chip (SoC) designers are confronted with a variety of alternative embedded memory technologies including SRAM, DRAM, and flash memory. Each of these memory options has both strengths and weaknesses. SRAM offers compatibility with logic and fast read and write speeds at the cost of large 4- or 6-transistor storage cells and relatively high dynamic power consumption. DRAM offers high storage density, but embedding DRAM in an SoC design typically requires expensive modifications to standard logic processes and usually entails compromises to the performance of the resulting logic and/or memory. Neither SRAM nor DRAM offers nonvolatility, which is essential for some applications and would be attractive for many others. Flash memory and EEPROM macros are both available in standard foundry processes, but the minimum available feature sizes are typically one to two generations behind state-of-the-art line widths. Also, provisions must be made for providing high programming voltages. Several emerging nonvolatile memory technologies are under active development. Some of these are touted as having the potential to become the ultimate memory for SoC designs, combining nonvolatility with access times approaching those of SRAM and densities approaching those of DRAM. Magneto-resistive memory (MRAM) is being developed at Motorola and collaboratively by IBM and Infineon Technologies. Motorola believes that MRAM has the potential to become a "universal memory" technology that will have wide application in portable computers, consumer electronics, and wireless devices. Ferroelectric memory (FeRAM and FRAM) is under development by numerous companies, including Ramtron, Fujitsu, Intel, Samsung, and collaboratively by Infineon and Toshiba. FeRAM is also touted as potentially being a universal memory technology for SoCs. A third candidate memory technology, called ovonics unified memory (OUM), is being investigated by STMicroelectronics, British Aerospace, and collaboratively by Intel, Azalea Microelectronics and Ovonyx. Intel believes that OUM may be easier to integrate with standard CMOS than MRAM, but the industry's largest player appears to be backing research drives in both OUM and FeRAM. All three of these nonvolatile technologies show promise for integration in CMOS processes, although it is unclear how soon these technologies will become available at leading edge line widths. The panel will include advocates of MRAM, FeRAM and OUM. The participants will argue the merits of their respective technologies with respect to the alternatives.
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高级嵌入式存储器技术专题讨论会
目前,片上系统(SoC)设计人员面临着各种可替代的嵌入式存储技术,包括SRAM, DRAM和闪存。每种存储选项都有优点和缺点。SRAM提供了逻辑和快速读写速度的兼容性,但代价是大型4或6晶体管存储单元和相对较高的动态功耗。DRAM提供高存储密度,但在SoC设计中嵌入DRAM通常需要对标准逻辑过程进行昂贵的修改,并且通常需要妥协所产生的逻辑和/或内存的性能。SRAM和DRAM都不能提供非易失性,这对某些应用来说是必不可少的,对许多其他应用来说也很有吸引力。闪存和EEPROM宏在标准的代工工艺中都是可用的,但最小可用特征尺寸通常比最先进的线宽落后一到两代。此外,必须为提供高编程电压作出规定。一些新兴的非易失性存储技术正在积极发展。其中一些被吹捧为有潜力成为SoC设计的终极存储器,结合了非易失性、接近SRAM的访问时间和接近DRAM的密度。磁阻存储器(MRAM)是由摩托罗拉和IBM和英飞凌技术合作开发的。摩托罗拉认为,MRAM有潜力成为一种“通用内存”技术,将在便携式电脑、消费电子产品和无线设备中得到广泛应用。铁电存储器(FeRAM和FRAM)正在由许多公司开发,包括Ramtron,富士通,英特尔,三星,以及英飞凌和东芝的合作。FeRAM也被吹捧为潜在的soc通用存储技术。第三种候选存储技术称为ovonics统一存储(OUM),由意法半导体(STMicroelectronics)、英国航空航天公司(British Aerospace)以及英特尔(Intel)、杜鹃花微电子(Azalea Microelectronics)和Ovonyx合作研究。英特尔认为,OUM可能比MRAM更容易与标准CMOS集成,但业界最大的参与者似乎支持OUM和FeRAM的研究驱动。这三种非易失性技术都有望集成到CMOS工艺中,尽管目前尚不清楚这些技术将在多快的时间内应用于前沿线宽。该小组将包括MRAM、FeRAM和OUM的倡导者。与会者将讨论各自技术相对于替代方案的优点。
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