Low cost X-band power amplifier MMIC fabricated on a 0.25 /spl mu/m GaAs pHEMT process

W. Bosch, J. Mayock, M. O'Keefe, J. McMonagle
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引用次数: 11

Abstract

A family of X-Band MMIC power amplifiers using a low cost GaAs pHEMT process is reported. The stepper based volume 0.5 micron and 0.25 micron GaAs pHEMT processes utilize 4 inter-level metallisation and four dielectric layers for high frequency performance whilst maintaining the economies of scale of 150 mm (6") diameter substrates. The fabricated GaAs X-Band PA MMICs exhibit 5 W to 10 W RF output power under pulsed conditions; 16 dB of power gain and power added efficiencies approaching 40%. Excellent repeatability and high yields over a number of wafers have been demonstrated. The design and GaAs process approach taken here with DUV stepper and 150 mm wafer diameter will lead to a significant cost reduction for high performance power amplifier MMICs up to 30 GHz.
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采用0.25 /spl μ m GaAs pHEMT工艺制造的低成本x波段功率放大器MMIC
报道了一种采用低成本GaAs pHEMT工艺的x波段MMIC功率放大器系列。基于步进的体积0.5微米和0.25微米GaAs pHEMT工艺利用4个层间金属化和4个介电层来实现高频性能,同时保持150mm(6”)直径基板的规模经济。制备的GaAs x波段PA mmic在脉冲条件下具有5 W至10 W的RF输出功率;16 dB的功率增益和功率增加效率接近40%。优异的重复性和高产量在许多晶圆已被证明。采用DUV步进器和150mm晶圆直径的设计和GaAs工艺方法将显著降低高达30ghz的高性能功率放大器mmic的成本。
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