Ammonia sensors based on in situ fabricated nanocrystalline graphene field-effect devices

Dennis Noll, U. Schwalke
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Abstract

By transfer-free in situ catalytic chemical vapor deposition (CCVD) hundreds of nanocrystalline graphene field-effect transistors (ncGFETs) have been fabricated on a single 2″ silicon substrate. Raman spectroscopic analysis of the grown nanocrystalline graphene shows a clear signature of the G and a weak 2D peak in accoordance with the Raman spectra of nanocrystalline graphene from Schmidt et al. [1]. Using a grounded backgate ncGFET, the detection of ammonia (NH3) is demonstrated for room temperature (300 K) and 425 K, achieving detection down to a volume concentration of 100 parts-per-billion-volume (ppbv). By this method, a sensitivity of S4ppm, 425 k = 80.6% can be found for a volume concentration of 4 parts-per-million-volume (ppmv) of NH3 at a temperature of 425 K. In addition, by evaluation of the input characteristics of our ncGFET under different volume concentrations of ammonia we observe a global increase in the conductivity, which influences the sensitivity of our devices as well as of the negative shift of the charge neutrality point.
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基于原位制备纳米晶石墨烯场效应器件的氨传感器
利用无转移原位催化化学气相沉积(CCVD)技术,在2″硅衬底上制备了数百个纳米晶石墨烯场效应晶体管(ncgfet)。对生长的纳米晶石墨烯的拉曼光谱分析显示,与Schmidt等人[1]的纳米晶石墨烯的拉曼光谱一致,有明显的G特征和弱的2D峰。使用接地后门ncGFET,演示了在室温(300 K)和425 K下对氨(NH3)的检测,实现了低至百万分之一体积(ppbv)的检测。在425 k温度下,当NH3的体积浓度为百万分之4 (ppmv)时,灵敏度为S4ppm, 425 k = 80.6%。此外,通过评估我们的ncGFET在不同体积浓度的氨下的输入特性,我们观察到电导率的整体增加,这影响了我们的器件的灵敏度以及电荷中性点的负移。
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