Radiation induced trap levels in SIMOX oxides: low temperature thermally stimulated luminescence

M. Martini, F. Meinardi, E. Rosetta, G. Spinolo, A. Vedda, J. Leray, P. Paillet, J. Autran, R. Devine
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引用次数: 14

Abstract

Thermally Stimulated Luminescence (TSL) properties of SIMOX oxides, induced by x-irradiation, have been studied in the temperature range 100-400 K. For the first time studied in SIMOX, a series of TSL peaks at 110, 150 and 200 K appear clearly. A continuous distribution of trap levels ranging from 0.4 to 1.1 eV has been found to be responsible for the broad and intense peak observed at 200 K; moreover, the wavelength distribution of the emitted light has revealed the presence of an emission centred at 2.7 eV. A comparison with the TSL properties of synthetic silica is presented, and the results are discussed also in the light of previous characterizations of trap levels obtained by electrical techniques. This study gives new insight concerning the electron and hole traps structures in SIMOX compared to bulk silica.
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SIMOX氧化物中的辐射诱导阱水平:低温热激发发光
在100 ~ 400 K的温度范围内,研究了SIMOX氧化物在x射线照射下的热激发发光(TSL)特性。首次在SIMOX中研究,在110、150和200 K处清晰地出现了一系列的TSL峰。在200k处观察到的宽而强的峰是由0.4 ~ 1.1 eV的连续分布的阱能级引起的;此外,发射光的波长分布表明存在以2.7 eV为中心的发射。将其与合成二氧化硅的TSL特性进行了比较,并根据先前通过电技术获得的陷阱能级的表征对结果进行了讨论。该研究对SIMOX中电子和空穴陷阱结构的研究提供了新的见解。
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