Degradation of GaN high-electron mobility transistors in voltage step stress

Xinhua Wang, L. Pang, Jianhui Wang, T. Yuan, W. Luo, Xiaojuan Chen, Xinyu Liu
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引用次数: 4

Abstract

Voltage step-stress tests on GaN-on-SiC HEMT showed that electric field is a driving factor for degradation. The position of localized damage is corresponding to the high electric field region. A degradation mode different from previous reports is observed, which led to an increase of drain current after stress in certain conditions. We attribute this to the collection of the positive mobile charge under the gate during the stress.
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电压阶跃应力下氮化镓高电子迁移率晶体管的退化
在GaN-on-SiC HEMT上进行的电压阶跃应力测试表明,电场是导致其降解的驱动因素。局部损伤的位置与高电场区相对应。观察到与以往报道不同的退化模式,这导致在某些条件下应力后漏极电流增加。我们将此归因于在应力过程中栅极下的正移动电荷的收集。
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