{"title":"VLSI scaling trends and challenges","authors":"S. Rusu","doi":"10.1109/TUTCAS.2001.946980","DOIUrl":null,"url":null,"abstract":"This article discusses trends in VLSI technology evolution. It concentrates on challenges to VLSI scaling, including transistor scaling, interconnect scaling, leakage currents and silicon-on-insulator technology. It concludes that we still have not found a fundamental barrier to extending Moore's law and that the major challenge to scaling in the future will be power and efficiency.","PeriodicalId":376181,"journal":{"name":"Tutorial Guide. ISCAS 2001. IEEE International Symposium on Circuits and Systems (Cat. No.01TH8573)","volume":"7 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2001-05-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Tutorial Guide. ISCAS 2001. IEEE International Symposium on Circuits and Systems (Cat. No.01TH8573)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/TUTCAS.2001.946980","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
This article discusses trends in VLSI technology evolution. It concentrates on challenges to VLSI scaling, including transistor scaling, interconnect scaling, leakage currents and silicon-on-insulator technology. It concludes that we still have not found a fundamental barrier to extending Moore's law and that the major challenge to scaling in the future will be power and efficiency.