{"title":"Performance comparison on D.C properties of heterostructure DDR IMPATT with conventional diode","authors":"A. Deyasi, Kasturi Mukherjee, S. Bhattacharyya","doi":"10.1109/ICECI.2014.6767375","DOIUrl":null,"url":null,"abstract":"In this paper, electric field profile, normalized current density, breakdown voltage and conversion efficiency of Si/Si0.9Ge0.1 DDR IMPATT are numerically computed and results are compared with Si DDR diode for optimized input bias current. Double iterative technique is used for computational purpose which is based on simultaneous numerical solution of Poisson's equation, carrier diffusion equation and continuity equation in addition with the effect of mobile space charge. Electric field and normalized current profiles are obtained subject to the appropriate boundary conditions. Breakdown voltage and conversion efficiency are calculated for optimized input bias current density. Doping concentration is so chosen to obtain punch-through effect. Results are useful for small-signal analysis at microwave and millimeterwave frequency range.","PeriodicalId":315219,"journal":{"name":"International Conference on Electronics, Communication and Instrumentation (ICECI)","volume":"24 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2014-03-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Conference on Electronics, Communication and Instrumentation (ICECI)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICECI.2014.6767375","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
In this paper, electric field profile, normalized current density, breakdown voltage and conversion efficiency of Si/Si0.9Ge0.1 DDR IMPATT are numerically computed and results are compared with Si DDR diode for optimized input bias current. Double iterative technique is used for computational purpose which is based on simultaneous numerical solution of Poisson's equation, carrier diffusion equation and continuity equation in addition with the effect of mobile space charge. Electric field and normalized current profiles are obtained subject to the appropriate boundary conditions. Breakdown voltage and conversion efficiency are calculated for optimized input bias current density. Doping concentration is so chosen to obtain punch-through effect. Results are useful for small-signal analysis at microwave and millimeterwave frequency range.
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