High Performance Sol-gel Processed SnO2 thin film transistor with sol-gel processed ZrO2 layers

Won-Yong Lee, Bongho Jang, Sojeong Lee, Taegyun Kim, Jaewon Jang
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引用次数: 3

Abstract

We propose an effective process for the enhancement of electrical performance in solution-processed SnO2-based oxide thin-film transistors (TFTs) by adding a ZrO2layer on the active layer. The ZrO2layer was spin coated on the SnO2film with a single coating and double coating process under the same condition. The SnO2 TFTs with double-coated ZrO2 layers showed a saturation mobility of 51.2 cm2/Vs, which was more than four times higher than that of conventional SnO2 TFTs. Furthermore, the subthreshold slope reduced from 1.17 V /decade to 0.36 V /decade for SnO2 TFTs with double-coated ZrO2 layers. These results are attributed to the electron transfer based on the theory of electron donation from high-k dielectrics to oxide semiconductors.
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具有溶胶-凝胶处理ZrO2层的高性能溶胶-凝胶处理SnO2薄膜晶体管
我们提出了一种有效的方法,通过在有源层上添加zro2层来提高溶液处理sno2基氧化物薄膜晶体管(TFTs)的电性能。在相同的条件下,采用单涂层和双涂层两种工艺将zro2层自旋涂覆在sno2薄膜上。采用ZrO2双层涂层的SnO2 tft的饱和迁移率为51.2 cm2/Vs,是传统SnO2 tft的4倍以上。此外,对于双ZrO2涂层的SnO2 tft,亚阈值斜率从1.17 V /decade降低到0.36 V /decade。这些结果归因于基于高k介电体给电子理论的电子转移到氧化物半导体。
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