Electrical characterization of polysilicon surface roughness in double polysilicon EPROMS

R. Turkman
{"title":"Electrical characterization of polysilicon surface roughness in double polysilicon EPROMS","authors":"R. Turkman","doi":"10.1109/UGIM.1991.148126","DOIUrl":null,"url":null,"abstract":"Data retention in floating gate double-polysilicon erasable programmable read-only memories (EPROMs) strongly depends on the insulating properties of the interpolyoxide layer. The author describes a method for rapid evaluation of the interpolyoxide quality and the surface texture of the underlying polysilicon by simple electrical measurements. First, the electrical conduction mechanism in the interpolyoxide is discussed. A simple quantitative model relating the increased conductivity of polyoxides to the polysilicon surface morphology is presented. The test structures used in this study, the interpolyoxide conductivity measurements, and the proposed characterization technique are described. The results are discussed, and the predicted poly surface roughness is compared to that obtained by transmission electron microscopy (TEM).<<ETX>>","PeriodicalId":163406,"journal":{"name":"Proceedings Ninth Biennial University/Government/Industry Microelectronics Symposium","volume":"319 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1991-06-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings Ninth Biennial University/Government/Industry Microelectronics Symposium","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/UGIM.1991.148126","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

Abstract

Data retention in floating gate double-polysilicon erasable programmable read-only memories (EPROMs) strongly depends on the insulating properties of the interpolyoxide layer. The author describes a method for rapid evaluation of the interpolyoxide quality and the surface texture of the underlying polysilicon by simple electrical measurements. First, the electrical conduction mechanism in the interpolyoxide is discussed. A simple quantitative model relating the increased conductivity of polyoxides to the polysilicon surface morphology is presented. The test structures used in this study, the interpolyoxide conductivity measurements, and the proposed characterization technique are described. The results are discussed, and the predicted poly surface roughness is compared to that obtained by transmission electron microscopy (TEM).<>
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
双多晶硅eprom中多晶硅表面粗糙度的电学表征
浮栅双多晶硅可擦可编程只读存储器(eprom)中的数据保留很大程度上取决于多氧化物间层的绝缘性能。作者描述了一种通过简单的电测量快速评价多晶硅的多氧化物质量和表面纹理的方法。首先,讨论了聚氧化物间的导电机理。提出了一个简单的定量模型,将多晶硅表面形貌与多氧化物电导率的增加联系起来。本文描述了本研究中使用的测试结构、多氧化物间电导率测量以及提出的表征技术。对结果进行了讨论,并将预测的聚面粗糙度与透射电子显微镜(TEM)得到的结果进行了比较。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Cooperative research and technology transfer A novel method of forming a thin single crystal silicon diaphragm with precise thickness for potential use in fabricating micromechanical sensors using merged epitaxial lateral overgrowth A DC model for the HEMT including the effect of parasitic conduction A subthreshold model for the analysis of MOS IC's University/government/industry program in analog/digital integrated circuits
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1