{"title":"Laser Spectroscopy of Chemical Vapor Deposition","authors":"W. Breiland, P. Ho, M. Coltrin","doi":"10.1364/lmd.1987.wd1","DOIUrl":null,"url":null,"abstract":"Chemical vapor deposition (CVD) is an important industrial process used\n to deposit solid films for protective coatings and microelectronic\n applications. The CVD processes used in the fabrication of\n microelectronic devices are becoming more complex, and higher demands\n are being made on the resulting films. A fundamental understanding of\n the chemistry and physics of CVD may help meet future process control\n requirements, and could lead to novel deposition methods.","PeriodicalId":331014,"journal":{"name":"Topical Meeting on Lasers in Materials Diagnostics","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Topical Meeting on Lasers in Materials Diagnostics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/lmd.1987.wd1","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Chemical vapor deposition (CVD) is an important industrial process used
to deposit solid films for protective coatings and microelectronic
applications. The CVD processes used in the fabrication of
microelectronic devices are becoming more complex, and higher demands
are being made on the resulting films. A fundamental understanding of
the chemistry and physics of CVD may help meet future process control
requirements, and could lead to novel deposition methods.
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