Improving breakdown voltage of double-channel E-mode AlGaN/GaN HEMTs using a double-gate structure

Yang-Hua Chang, Chien-min Wang
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Abstract

In this study, the characteristics of a double-channel AlGaN/GaN HEMT are improved. Firstly, depletion mode is changed to enhancement mode by changing the thickness of an AlGaN layer, implementing a p-doped region, and changing the material of buffer layer. Secondly, Al ratio in the upper AlGaN layer is optimized to improve the flatness of Gm-VGS curve so that the linearity is improved. Finally, breakdown voltage is increased by using a double-gate structure.
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采用双栅极结构提高双通道e模AlGaN/GaN hemt的击穿电压
在本研究中,改进了双通道AlGaN/GaN HEMT的特性。首先,通过改变AlGaN层的厚度,实现p掺杂区域,改变缓冲层的材料,将耗尽模式转变为增强模式。其次,优化AlGaN上层Al的比例,提高Gm-VGS曲线的平整度,从而提高线性度;最后,采用双栅结构提高击穿电压。
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