Study on Space Morphology of Molecular Structure of Tungsten Trioxide Compound Film Surface by AFM

Ding Zhong, Hui Yang, Xueheng Yang, Yan Xu, Xianwu Han, Xiaoping Su, Anping Liu, Taiguo Tang, Changshui Chen
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Abstract

In this paper, the molecular structures of tungsten trioxide (WO3) crystal film surfaces are studied by AFM.IPC-208B, and their XRD spectrums are also analyzed. Two types of crystal film are: WO3 sol-gel film adulterated with platinum and WO3 magnetron ion sputtering film adulterated with platinum. The studies on WO3 sol-gel film adulterated with platinum show that it has been cubic crystal after annealing at 460degC, its crystal cell includes a WO6 octahedron in which six oxygen ions locate in the center of six planes of cube and one tungsten ion locates in the center of cube, its lattice parameter is about 0.75 plusmn 0.05 nm, its natural growth surface is (002) plane on which its one cell includes five ions, four oxygen ions locate in the culminations of quadrangle and one tungsten ion locates in the center of quadrangle, and the distance between two adjacent oxygen ions is about 0.55 plusmn 0.05 nm. Meanwhile the studies on WO3 magnetron ion sputtering film adulterated with platinum find that it has also been plate crystal after annealing at 400degC , its crystal cell includes four tetrahedrons, its natural growth surface is (106) plane on which its one cell includes three tungsten ions and seven oxygen ions or two tungsten ions and eight oxygen ions, these ions locate in the culminations of four coterminous quadrangles, and its lattice parameters are about 1.35 plusmn 0.05 nm and 0.35 plusmn 0.05 nm, respectively. The above results on molecular structures of WO3 crystal film surfaces have never been seen in overseas or home reports.
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原子力显微镜研究三氧化钨复合膜表面分子结构的空间形貌
本文采用原子力显微镜研究了三氧化钨(WO3)晶体膜表面的分子结构。对IPC-208B进行了XRD分析。掺杂铂的WO3溶胶-凝胶膜和掺杂铂的WO3磁控离子溅射膜两种类型的晶体膜。对掺杂铂的WO3溶胶-凝胶膜的研究表明,在460℃退火后,WO3溶胶-凝胶膜已成立方晶体,其晶胞包括一个WO6八面体,其中6个氧离子位于立方体的6个平面中心,1个钨离子位于立方体的中心,其晶格参数约为0.75 plusmn 0.05 nm,其自然生长面为(002)平面,其中一个晶胞包含5个离子。四个氧离子位于四边形的顶点,一个钨离子位于四边形的中心,两个相邻氧离子之间的距离约为0.55±0.05 nm。同时,对掺杂铂的WO3磁控离子溅射膜的研究发现,在400℃退火后,其晶胞包括4个四面体,其自然生长面为(106)面,其中一个晶胞包含3个钨离子和7个氧离子或2个钨离子和8个氧离子,这些离子位于4个共端四边形的顶点。其晶格参数分别约为1.35 plusmn 0.05 nm和0.35 plusmn 0.05 nm。上述关于WO3晶体膜表面分子结构的结果,国内外均未见报道。
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