Reliability in VHSIC-level 1.25 mu m radiation-hard CMOS IC devices

F. Evans, J. Wall, B. Hancock, P. Brusius, M. Mitchell
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引用次数: 2

Abstract

An experiment was performed on 1.25 mu m radiation-hard, very high-speed integrated circuit (VHSIC)-level 2 K*8 static random access memory (SRAM) devices with the objective of investigating the relationship between the SRAM reliability and the die yield at wafer probe. The SRAMs were product-level devices that were included as part of a test chip, the yield/circuit/reliability analysis tool (YCRAT). There were 54 YCRAT sites on each four-inch wafer. After all wafer-level tests, 423 SRAMs were packaged in 24-pin flatpacks and subjected to a 1000 h, 125 degrees C life test. 183 of the parts were from wafers judged to be bad, i.e. for some reason the SRAM dice or test structures did not pass wafer-level screening, and 240 parts were from wafers judged to be good, i.e. they passed wafer-level screening. The results of the test showed that wafers exhibiting metal/dielectric problems had poor yields through screening and somewhat worse reliability.<>
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vhsic级1.25 μ m抗辐射CMOS IC器件的可靠性
在1.25 μ m抗辐射、超高速集成电路(VHSIC)级2 K*8静态随机存取存储器(SRAM)器件上进行了实验,研究了SRAM可靠性与晶圆探头芯片良率之间的关系。sram是产品级器件,作为测试芯片,产量/电路/可靠性分析工具(YCRAT)的一部分。每个4英寸的晶圆上有54个YCRAT点。在所有晶圆级测试之后,将423个sram封装在24针平板封装中,并进行1000小时,125摄氏度的寿命测试。其中183个零件来自被判定为不良的晶圆,即由于某种原因SRAM片或测试结构没有通过晶圆级筛选,240个零件来自被判定为良好的晶圆,即通过了晶圆级筛选。测试结果表明,存在金属/介电问题的晶圆通过筛选后的良率较低,可靠性较差。
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